Method of fabricating microelectronic devices and related microelectronic devices, tools, and apparatus

ABSTRACT

A microelectronic device may have side surfaces each including a first portion and a second portion. The first portion may have a highly irregular surface topography extending from an adjacent surface of the microelectronic device. The second portion may have a less uneven surface extending from the first portion to an opposing surface of the microelectronic device. Methods of forming the microelectronic device may include creating dislocations in the wafer in a street between the one or more microelectronic devices by implanting ions and cleaving the wafer responsive to failure of stress concentrations near the dislocations through application of heat, tensile forces or a combination thereof. Related packages and methods are also disclosed.

TECHNICAL FIELD

Embodiments of the disclosure relate to a method of fabricatingmicroelectronic devices. Specifically, embodiments relate to methods ofseparating wafers comprising arrays of microelectronic device locationsinto individual microelectronic devices, and to related microelectronicdevices, tools, and apparatus.

BACKGROUND

As performance of electronic devices and systems increases, there is anassociated demand for improved performance of the microelectroniccomponents of such systems, while maintaining or even shrinking the formfactor (i.e., length, width and height) of a microelectronic device orassembly. Such demands are often, but not exclusively, associated withmobile devices and high-performance devices. To maintain or reduce thefootprint and height of an assembly of components in the form ofmicroelectronic devices (e.g., semiconductor dice), three-dimensional(3D) assemblies of stacked components equipped with so-called throughsilicon vias (TSVs) for vertical electrical (i.e., signal, power,ground/bias) communication between components of the stack have becomemore common, in combination with the reduction in component thickness,as well as employment of preformed dielectric films in the bond lines(i.e., spaces between stacked components) to reduce bond line thicknesswhile increasing bond line uniformity. Such dielectric films include,for example, so-called non-conductive films (NCFs), and wafer levelunderfills (WLUFs), such terms often being used interchangeably. Whileeffective in reducing height of 3D microelectronic device assemblies,the reduction in thickness of microelectronic devices, for examplesemiconductor dice, to about 50 μm or less (e.g., 30 μm, 20 μm)increases device fragility and susceptibility to cracking under stress,particularly compressive (i.e., impact) stress and bending stress.Decreasing bond line thickness may also exacerbate susceptibility todamage to such extremely thin microelectronic devices, as the thindielectric material (e.g., NCF) in the bond lines may no longer provideany cushioning effect or ability to accommodate particulate contaminantsin the bond lines when, for example, a device is stacked on anotherdevice to form a 3D assembly. Non-limiting examples of microelectronicdevice assemblies including stacked microelectronic devices which maysuffer from stress-induced cracking include assemblies of semiconductormemory dice, alone or in combination with other die functionality (e.g.,logic) include so-called high bandwidth memory (HBMx), hybrid memorycubes (HMCs), and chip to wafer (C2 W) assemblies.

Furthermore, as the demand for microelectronic devices increases, thedemand for lower cost microelectronic devices also increases,incentivizing the continued increase in circuit density and devices perwafer. The cost of producing microelectronic devices may be reduced byincreasing efficiency of the processes, increasing the yield ofmicroelectronic devices per wafer for each respective process andreducing losses, such as due to circuit failures, physical die cracking,microcracking, and fractures, etc. Decreasing the cost of themicroelectronic devices may, in turn, decrease the cost of theassociated electronic assemblies and systems incorporating suchmicroelectronic devices. In some cases decreasing the cost of themicroelectronic devices may also enable increases in performance of theassociated electronic devices without being cost prohibitive.

BRIEF DESCRIPTION OF THE DRAWINGS

While the specification concludes with claims particularly pointing outand distinctly claiming embodiments of the present disclosure, theadvantages of embodiments of the disclosure may be more readilyascertained from the following description of embodiments of thedisclosure when read in conjunction with the accompanying drawings inwhich:

FIG. 1 illustrates a schematic view of a microelectronic device assemblycomprising stacked semiconductor dice;

FIG. 2 illustrates a perspective view of a wafer with an array ofmicroelectronic device locations formed thereon;

FIGS. 3-8 illustrate cross-sectional views of process acts of formingmicroelectronic devices in accordance with an embodiment of the presentdisclosure;

FIG. 9 illustrates a plan view of a side surface of a microelectronicdevice in accordance with an embodiment of the present disclosure;

FIG. 10 illustrates a profile view of a side surface of amicroelectronic device in accordance with an embodiment of the presentdisclosure;

FIG. 11 illustrates a top view of a microelectronic device in accordancewith an embodiment of the present disclosure; and

FIG. 12 illustrates a schematic side view of a microelectronic devicepackage comprising a stack of microelectronic devices in accordance withan embodiment of the present disclosure.

DETAILED DESCRIPTION

The illustrations presented herein are not meant to be actual views ofany particular microelectronic device, assembly, or component thereof,but are merely idealized representations employed to describeillustrative embodiments. The drawings are not necessarily to scale.

As used herein, the term “substantially” in reference to a givenparameter means and includes to a degree that one skilled in the artwould understand that the given parameter, property, or condition is metwith a small degree of variance, such as within acceptable manufacturingtolerances. For example, a parameter that is substantially met may be atleast about 90% met, at least about 95% met, at least about 99% met, oreven at least about 100% met.

As used herein, relational terms, such as “first,” “second,” “top,”“bottom,” etc., are generally used for clarity and convenience inunderstanding the disclosure and accompanying drawings and do notconnote or depend on any specific preference, orientation, or order,except where the context clearly indicates otherwise.

As used herein, the term “and/or” means and includes any and allcombinations of one or more of the associated listed items.

As used herein, the terms “vertical,” “horizontal,” and “lateral” referto the orientations as depicted in the figures.

As the demand for microelectronic components increases, the demand forlower cost microelectronic components also increases. The cost ofproducing microelectronic devices may be reduced by increasing the yieldof microelectronic devices for each act performed in the fabricationprocess. Yield may be increased by reducing losses, such as faileddevices, broken devices, etc. Another way that the yield may beincreased is by reducing the area of a semiconductor wafer that isrequired between adjacent microelectronic device locations. For example,reducing a width of the so-called “street” or “scribe” area betweenadjacent, individual microelectronic device locations where thesemiconductor wafer is singulated or diced to separate the semiconductorwafer into separate microelectronic devices may increase the area of thesemiconductor wafer that is available for forming the microelectronicdevices. Thus, decreasing the street width between the individualmicroelectronic devices may enable a larger number of microelectronicdevices to be formed from each semiconductor wafer.

FIG. 1 illustrates a microelectronic device 100. The microelectronicdevice assembly 100 may include multiple semiconductor dice 102 arrangedin a stack. A dielectric film 104, such as a non-conductive film (NCF)or a wafer level underfill (WLUF) may be positioned in a so-called bondline between each of the semiconductor dice 102. The microelectronicdevice 100 may include through silicon vias (TSVs) 106 aligned withcontacts in the form of conductive pillars 108 p optionally capped withsolder material 108 s and bonded to terminal pads 108 t of adjacentsemiconductor dice 102 to provide electrical contacts between thesemiconductor dice 102 and/or through the stack of dice. For example,the TSVs 106 and aligned contacts may provide power, ground/bias, andsignal connections.

The height of the microelectronic device 100 may be reduced by reducinga thickness of the semiconductor dice 102 and/or the dielectric film104. Reducing the thickness of the semiconductor die 102 may cause asemiconductor die 102 to be more fragile and susceptible to damage inthe form of microcracking, cracking and edge chipping during the pickingand stacking processes as described in further detail below. Reducingthe thickness of the dielectric film 104 may reduce the ability of thedielectric film 104 to provide any cushioning effect between adjacentsemiconductor dice 102 during stacking, as well as the ability toaccommodate particulate contaminants generated during separation of thesemiconductor dice 102 in bond lines thinner than the particle sizewithout damage to the semiconductor dice 102. For example, contaminantparticles between the semiconductor dice 102 may cause one or more ofthe semiconductor die 102 to crack or microcrack due to stressconcentrations caused by the presence of contaminant particles largerthan a thickness of dielectric film 104 when a semiconductor die 102 ispicked from a carrier, transferred to a bond tip, or stacked on anothersemiconductor die 102 or a substrate. Further, in some instances,contaminant particles between the semiconductor die 102 maysubstantially prevent one or more of the conductive pillars 108 p frommaking electrical contact with an aligned terminal pad 108 t, orcompromise integrity of such contact.

Reducing and/or eliminating the introduction of contaminant particles tosurfaces of the semiconductor dice during the singulation process mayincrease a yield of microelectronic devices by substantially reducingthe losses from damage caused by such particles. Increasing the yield ofmicroelectronic devices may decrease the costs associated with producingthe microelectronic devices. These reduced costs may similarly reducecosts of associated electronic products incorporating themicroelectronic devices, such as mobile phones, computers, laptops, etc.

Some embodiments of the present disclosure may include a method offabricating a microelectronic device, including forming an array ofmicroelectronic device locations on an active surface of a wafer. Themethod may further include securing the wafer to a carrier wafer. Themethod may also include thinning the wafer to about 30 microns (μm) orless. The method may further include implanting ions to initiatedislocations in semiconductor material of the wafer along streetsbetween the microelectronic devices. The method may also include heatingthe wafer to form cracks along the streets from stress concentrationsproximate the dislocations.

During the fabrication process, semiconductor dice may be formed in anarray on a wafer. The locations of individual dice 204 may be formed onan active surface 208 of a wafer 202. The wafer 202 may be formed from asemiconductor material, such as silicon configured to provide asubstrate for fabrication of integrated circuitry as well as structuralsupport to the dice 204. The dice 204 may be formed by building uplayers of insulating and conductive materials on the active surface 208of the wafer 202 through processes, such as plating, sputtering, etc.The process of forming the dice 204 may also include material removalprocesses, such as wet etching, dry etching, photolithography, etc. Thematerial removal and/or build up processes may utilize masks to controlwhere material is removed and/or built up. The building up and removalprocesses may form features of the microelectronic devices, such asvias, through silicon vias (TSVs), wiring paths, under bumpmetallization (UBM), etc.

Each die 204 may be separated from adjacent dice 204 by streets 206. Awidth of the streets 206 may define distances between the dice 204. Whenusing conventional singulation processes, reductions in width of thestreets 206 may be constrained by the width required by the tool (e.g.,wafer saw, laser beam, etc.) used to singulate (e.g., dice, cut,separate) the wafer 202 into individual dice 204. Conventional bladedicing operations may require the width of the streets 206 to be betweenabout 20 micrometers (μm) and about 80 or even more, depending on bladewidth. Thus, a significant portion of the surface of the wafer 202 mustbe dedicated to the area of the streets 206 between the dice 204.Reducing the width of the streets 206 may enable a larger number of dice204 to be formed on each wafer 202, which may increase the yield foreach wafer 202.

After the dice 204 are formed on the active surface 208 of the wafer202, the wafer 202 may be coupled to a carrier wafer 304 through anadhesive 306, as illustrated in FIG. 3 . The adhesive 306 may couple theactive surface 208 of the wafer 202 to the carrier wafer 304, such thata rear surface 302 of the wafer 202 remains exposed. The adhesive 306,may be an adhesive material configured to secure the wafer 202 atelevated temperatures above ambient (e.g., about 25° C.) such astemperatures between about 150° C. and about 250° C., such as betweenabout 170° C. and about 220° C., or between about 180° C. and about 200°C. Some examples of adhesives that are formulated to secure a wafer atelevated temperatures may include BREWERBOND® materials sold by BREWERSCIENCE® of Missouri, the TA series of adhesives sold by SHIN-ETSU® ofTaiwan, or the XP series of adhesives sold by DOW CHEMICAL® of Michigan.The carrier wafer 304 may be configured to support the wafer 202 throughadditional prior processing acts, such as wafer thinning. For example,very thin wafers 202 may require exceptionally rigid support tosubstantially prevent cracking, warping, and other potential damage tothe wafer 202 during processing acts that may include temperaturechanges, mechanical material removal, chemical material removal, etc.

Once the wafer 202 is adhered to the carrier wafer 304, the wafer 202may be thinned as illustrated in FIG. 4 . The wafer 202 may be thinnedfrom an initial thickness, for example between about 775 μm and about600 μm through material removal processes, such as back grinding,polishing processes and wet etching. The material removal processes mayremove material from the exposed rear surface 302 of the wafer 202. Insome embodiments, a latter portion of the material removal process(i.e., wet etching) may be used to remove sufficient semiconductormaterial to expose features, such as TSVs through the rear surface 302of the wafer 202 to form electrical connections between the rear surface302 and integrated circuitry of the active surface 208 of the wafer 202.

The material removal process may thin the wafer 202 to a thickness ofless than about 50 such as less than about 30 less than about 20 or lessthan about 10 Reducing the thickness of the wafer 202 may in turn reducethe thickness of the resulting microelectronic devices. For example, theresulting microelectronic devices may have a thickness of between about30 μm and about 8 μm, such as between about 20 μm and about 7 to 10 Inthe latter case, the microelectronic devices may include integratedcircuitry to a depth of about 5 to 8 μm, and a thickness of supportingsemiconductor material of about 2 μm. While the wafer 202 is beingprocessed, one or more implantation (i.e., dopant) species may beimplanted into the streets 206 between the dice 204 in an implantprocess, as illustrated in FIG. 5 . FIG. 5 illustrates the implantprocess occurring on the rear surface 302 of the wafer 202 after thethinning process illustrated in FIG. 4 ; however, it is noted that theimplantation process may be performed at earlier stages and/or on theactive surface 208 of the wafer 202 as will be described in detailherein below.

During implantation, ions of an implantation species, such as hydrogen,helium, arsenic, boron, phosphorus, etc., may be accelerated toward asurface of the wafer 202. An implant tool 506 may include a beamgenerator 508 configured to accelerate the ions and form an energy beam512 of ions to impinge on the surface of the wafer 202. The beamgenerator 508 may receive ions of the respective species from an ionsource. The ions may then be accelerated to a high energy through anelectrostatic accelerator, such as a magnet or field of magnets. Afterbeing accelerated, the ions may have an energy of at least about 10kiloelectronvolts (keV), such as at least about 100 keV, or at leastabout 250 keV. The implant tool 506 of the present disclosure may beconfigured to implant ions into the wafer 202 without the aid of anincreased temperature, commonly referred to in the art as a temperaturedrive. Not increasing the temperature above ambient (e.g., about 25° C.)may allow the implant process to be performed after the dice 204 havebeen formed without compromising the thermal budget of the dice 204 andcausing damage to the integrated circuitry and associated features ofthe dice 204. Furthermore, not increasing the temperature may allow theimplant process to be performed on the wafer 202 after the thinningprocess without risk of warping or otherwise damaging the wafer underexcessive heat.

The energy imparted to the ions during implantation may affect the depthinto the wafer 202 that the ions will penetrate. For example, ionshaving higher energy may penetrate the wafer 202 to a greater depth thanions of the same species having a lower energy. The ion species may alsoeffect the penetration depth of the ions. For example, ions of a smallmolecular species, such as hydrogen or helium, may have a greaterpenetration depth than ions of a larger molecular species, such asboron, phosphorus, or arsenic. In some embodiments, multiple differentimplant species may be used on the same wafer 202, such that multipledifferent depths of penetration may be achieved in the same regions ofthe wafer 202. Penetration of the ions of the implantation species intothe semiconductor material of the wafer 202 may cause damage to thewafer 202, such as point defects, dislocations, etc., at the penetrationdepth and/or along the path to the penetration depth. During the implantprocess the ions may penetrate to depths of at least about 2 μm, such asat least about 3 μm, at least about 4 μm. The smaller species of ionsmay penetrate to greater depths, such as at least about 4 μm and maycause smaller amounts of damage during the penetrations. On the otherhand, while the larger species of ions may not penetrate the wafer to asgreat of a depth as the smaller species, the larger species of ions maygenerate larger amounts of damage at the lesser depth than the smallerspecies. In one implementation, hydrogen or helium ions may first beimplanted to an ultimate implantation depth, after which boron,phosphorous or arsenic ions may be implanted above and to a lesser depththan the hydrogen or helium molecules.

A mask 502 may be positioned between the implant tool 506 and the wafer202. The mask 502 may be configured to control and limit the portions ofthe wafer 202 on which the ions impinge. For example, the mask 502 mayinclude a pattern of openings 504. The openings 504 may be arranged suchthat the ions only impinge on the portions of the surface of the wafer202 that coincide with the streets 206 between the dice 204.

In some embodiments, the mask 502 may be positioned over the wafer 202,such as through a mask aligner or stepper, etc. For example, the mask502 may be aligned with the rear surface 302 of the wafer 202, asillustrated in FIG. 5 , such that the openings 504 in the mask 502 aresubstantially aligned with the streets 206 on the active surface 208 ofthe wafer 202. In some embodiments, the mask 502 may be formed on theactive surface 208 of the wafer 202 during the die fabrication processdiscussed with respect to FIG. 2 . For example, the mask 502 may bepositioned or formed on the active surface 208 of the wafer 202 and theions may be implanted into the streets 206 between the die 204 by theimplant tool 506 after the dice 204 are formed and before the activesurface 208 of the wafer 202 is coupled to the carrier wafer 304. Insome embodiments, the mask 502 may be one of the masks used in amaterial adding or material removal process as discussed above withrespect to FIG. 2 . The implant tool 506 may then implant the ions intothe active surface 208 of the wafer 202 during, directly before or afterone of the material build up or material removal processes.

In some embodiments, a material removal process, such as dry etching maybe used to remove material in the streets 206 and form trenches orchannels in the area of streets 206 before the implant process. Removingmaterial in the street 206 before the implant process may enable theimplanted ions to penetrate a greater distance into the wafer 202 fromthe active surface 208 before the material removal process. In someembodiments, the material removal process and the implant process mayutilize the same mask 502.

In some embodiments, the mask 502 may be coupled to the implant tool506. For example, the mask 502 may be a reusable mask 502 configured fora specific die type (i.e., length and width) coupled to a face 510 ofthe implant tool 506, or may be mounted internally within the toolchamber. The implant tool 506 may then be substantially aligned with thewafer 202, such that the openings 504 in the mask 502 are substantiallyaligned with the streets 206. The implant tool 506 may then implant ionsinto the active surface 208 and/or the rear surface 302 of the wafer 202through the openings 504 in the mask 502.

The openings 504 in the mask 502 may have a width corresponding to awidth of desired separation along streets between locations of dice 204of less than about 10 μm, such as between about 1 μm and about 10 μm, orbetween about 1 μm and about 5 μm, or between about 1 μm and about 2 μm.

FIG. 6 illustrates the wafer 202 after the thinning process of FIG. 4and the implant process of FIG. 5 . After the implant process the wafer202 may include an implanted region 602. The implanted region 602 mayinclude molecules of the implant species as well as dislocations andpoint defects associated with the implant process. As a result ofimplanting the wafer 202 through the mask 502, the implanted region 602may substantially coincide with the openings 504 in the mask 502.Therefore, the implanted region 602 may substantially coincide with thestreets 206 between the dice 204. The implanted region 602 may include aconcentration of implant species of between about 1e12 atoms/cm³ andabout 10e16 atoms/cm³, such as between about 1e12 atoms/cm³ and about5e16 atoms/cm³.

Larger concentrations of the implanted ion species may result in greateramounts of damage to the wafer 202 in the implanted regions 602. As theimplanted regions 602 may coincide with the streets 206 between the dice204, the damage to the wafer 202 may be substantially concentratedwithin the streets 206. As noted above, openings 504 in the mask 502 maybe sized, such that the implanted regions 602 may have a width 604 ofless than about 10 μm, such as between about 1 μm and about 5 μm, orbetween about 1 μm and about 2 μm.

The implanted regions 602 may have a greater amount of damage andresidual implanted ions proximate the active surface 208, or rearsurface 302 of the wafer 202 into which the ions were implanted by theimplant tool 506. The damage and/or residual implanted ions maygradually reduce as the depth into the wafer 202 increases.

In some embodiments, as illustrated in FIG. 7 , the wafer 202 may beheated while coupled to the carrier wafer 304. Heating the wafer 202 maycause the wafer 202 to fracture in the implanted regions 602. Forexample, the damage caused by the implanted ions in the implantedregions 602 may create stress concentrations within the wafer 202. Asthe wafer 202 is heated the stress concentrations in the implantedregions 602 may cause cracks 702 to propagate through the thickness ofthe wafer 202 in an area substantially aligned with the implantedregions 602 and cleave the semiconductor material along the area ofstreets 206. The cracks 702 may substantially separate (e.g., singulate)the wafer 202 into individual dice 204. Heating the wafer 202 aboveambient (e.g., about 25° C.) may cause the temperature of the wafer 202to rise between about 150° C. and about 250° C., such as between about170° C. and about 220° C., or between about 180° C. and about 200° C. Athigher concentrations of ions as well as damage in the implanted regions602, relatively lower temperature changes may generate the cracks 702and singulate the wafer 202. Similarly, deeper penetration may enablethe cracks 702 to be generated at lower temperatures. Thus, implantingions of a smaller species, such as hydrogen or helium, may enable thecracks 702 to propagate at lower temperatures, which may reduce the timeand energy required to singulate the wafer 202 and may reduce the risksof temperature damage to the wafer 202 and associated dice 204. It mayalso be desirable to implant smaller species of ions, for example,hydrogen or helium, in implementation of this embodiment in light of anobtainable deeper penetration depth at a reasonable energy level incomparison to larger species. In addition, singulating at lowertemperatures significantly reduces the impact on the thermal budget ofsemiconductor dice, lessening any potential for degradation of theintegrated circuitry.

The wafer 202 may be heated using heating tools, such as hot plates, hotchucks, lasers, resistance heaters, etc. For example, the carrier wafer304 and the wafer 202 may be placed on a hot plate or hot chuck. In somecases, a hot plate or hot chuck may contact the rear surface 302 of thewafer 202. In other embodiments, the beam of a laser may impinge on asurface 208, 302 of the wafer 202 or a resistance heater may be placedover wafer 202 in close proximity to cause the temperature of the wafer202 to increase. Heating wafer 202 from above may result in a smallertemperature gradient between the heat source and the implant area.

During the heating process the carrier wafer 304 and adhesive 306 may,in combination support the wafer 202 against any displacement. Forexample, the carrier wafer 304 may enable the wafer 202 to absorb theheat after thinning without any substantial heat damage, such aswarping, or shifting of position of the semiconductor dice 204singulated from the wafer. Further, singulation on the carrier wafer 304and picking the semiconductor dice 204 from the carrier wafer afterrelease of the adhesive 306 eliminates potential damage to wafer 202 andsemiconductor dice 204 resulting from transfer to an expandable carriermaterial (e.g., dicing tape, mount tape or film) for a subsequent pickand place operation of the semiconductor dice 204 with a pick tool, aswell as potential damage from debond of semiconductor dice 204 fromadhesive securing the dice to the carrier material. The adhesive 306 maybe formulated to release when exposed to light, such as in the infrared(IR) range or the ultraviolet (UV) range. Light in the IR or UV rangemay penetrate through the carrier wafer 304 causing the adhesive 306 torelease.

In some embodiments, the semiconductor dice 204 may be picked from thesurface of the carrier wafer 304 with a die stacking tool, such as abond head, configured to lift a semiconductor die 204 from the rearsurface 302. The die stacking tool may be configured to clean the activesurface 208 of the semiconductor die 204, to clear any residual adhesiveand/or particles from the active surface 208. For example, the diestacking tool may include a nozzle for cleaning the active surface 208of the semiconductor die 204. In some embodiments, the semiconductor die204 may be transferred to a cleaning tool, such as a cleaning platformconfigured to clean the residual adhesive from the active surface 208.The die stacking tool may then be configured to couple the semiconductordie 204 to other semiconductor dice forming a die stack, as discussed infurther detail below.

Some embodiments of the present disclosure may include a method ofseparating microelectronic devices (e.g., semiconductor dice) from awafer. The method may include employing an ion implantation process toprovoke dislocations in a semiconductor wafer in streets between themicroelectronic devices. The method may further include transferring thesemiconductor wafer to a laterally expandable carrier material andadhering the semiconductor wafer to a surface of the carrier material.The method may also include applying a tensile force on the wafer byexpansion of the carrier material to form cracks in the streets betweenthe microelectronic devices and separate the microelectronic devices.

In some embodiments, as illustrated in FIG. 8 , the wafer 202 may beinverted on the carrier wafer 304 and transferred to a carrier material802, such as dicing tape or mount tape or film. To transfer the wafer202 from the carrier wafer 304 to the carrier material 802, the adhesive306 may be released to release the wafer 202 from the carrier wafer 304.For example, the adhesive 306 may be released through a light or laserimpinging on the wafer 202 or carrier wafer 304. In other embodiments,the adhesive 306 may be released through other known methods, such aschemical releases and/or mechanical releases. The carrier material 802may be secured to and supported by a film frame 804. The carriermaterial 802 may include an adhesive 806 formulated to secure the wafer202 to the carrier material 802. The rear surface 302 of the wafer 202may be adhered to the carrier material 802, such that the active surface208 of the wafer 202 faces upwardly and away from the carrier material802.

The carrier material 802 may be a flexible material, expandable in theX-Y plane (i.e., laterally). After the wafer 202 is secured to thecarrier material 802, the carrier material 802 may be stretched by thefilm frame 804. Stretching the carrier material 802 may apply tensileforces on the wafer 202. The stress concentrations around the damage inthe implanted regions 602 may cause the wafer 202 to fracture and cleavealong the implanted regions 602 of streets 206, creating cracks 702through the wafer 202 that substantially coincide with the implantedregions 602 and/or the streets 206. The cracks 702 may substantiallyseparate the wafer 202 into individual semiconductor dice 204.

Larger amounts of damage in the implanted regions 602 may enable thecracks 702 to be formed with less tensile force. Thus, implanting theimplanted regions 602 with ions from larger species may enable thecracks 702 to form under less tensile force. Reducing the tensile forcemay enable lighter materials to be used for the carrier material 802 andmay reduce the amount thickness and strength of the adhesive required onthe carrier material 802. More options of carrier material 802 andadhesives may reduce the manufacturing costs, as carrier material 802will not have to support stresses incurred by conventional blade dicingor heat from laser or stealth dicing. Further, carrier material 802 mayprovide advantages in chemical resistance, use at lower temperatures andthinner adhesives to provide better fixed positioning of thesemiconductor dice 204. Suitable carrier materials include KAPTON®polyimide film from DuPont Corporation, as well as various adhesivefilms available from NITTO Americas and LINTEC Corporation.

In some embodiments, the wafer 202 may be separated through both aheating process as illustrated in FIG. 7 and the stretching processillustrated in FIG. 8 . For example, the wafer 202 may be heated on thecarrier wafer 304 as illustrated in FIG. 7 , causing fractures andcracks 702 to propagate through the wafer 202. After the cracks 702 areformed in the heating process, the wafer 202 may be transferred to thecarrier material 802 and stretched. Stretching the wafer 202 maycomplete any incomplete fractures or cracks 702, such as in areas wherethe concentration of damage and ions was insufficient to fracturecompletely through the thickness of the wafer 202 at the temperatureused in the heating process. In some embodiments, a significantly lowertemperature may be used on carrier wafer 304 to reduce a risk oftemperature damage to the wafer 202, such that the heating process mayexpand the damage and form some cracks 702, which the stretching processof FIG. 8 may complete any incomplete cracks 702.

In some embodiments, the wafer 202 may be heated after being transferredto the expandable carrier material 802. For example, some types ofcarrier materials 802 may be selected to withstand relatively hightemperatures, such that the wafer 202 may be heated while secured to theexpandable carrier material 802. In some cases, the wafer 202 may thenbe stretched on the expandable carrier material 802 to complete anyunfinished cracks 702 before picking the dice 204 from the surface ofthe carrier material 802. In other cases, the dice 204 may be pickedfrom the surface of the carrier material 802 without further stretchingthe wafer 202.

In some embodiments, the wafer 202 may be completely singulated throughonly one of the above processes. For example, the cracks 702 may beformed through the heating process of FIG. 7 and upon completing theheating process the individual dice 204 may then be picked from thesurface of the carrier wafer 304 or expandable carrier material 802 forfurther processing, such as stacking. In some embodiments, the wafer 202may be transferred to the carrier material 802 without having undergoneany heating and the wafer 202 may then be stretched as described aboveto singulate the wafer 202 into individual dice 204, which may then bepicked from the carrier material 802 to undergo further processing.

In implementing methods of the embodiments, successful cleaving of wafer202 on carrier wafer 304 due to heating may be confirmed by opticalinspection from above. If wafer 202 is cleaved on expandable carriermaterial 802, carrier material may be illuminated from below and anyuncleaved street areas detected optically as opaque or partiallyoccluded.

Some embodiments of the present disclosure may include a microelectronicdevice 900 (e.g., semiconductor die). The microelectronic device 900 mayinclude an active surface and a rear surface opposite the activesurface. The microelectronic device may further include side surfaces ofthe semiconductor material extending between the active surface and therear surface. The side surface may include a first portion having highlyirregular (i.e., jagged) surface topography. The highly irregularsurface topography may extend to a distance of between about 2 μm andabout 6 μm from at least one of the active surface 208 and the rearsurface 302 of the microelectronic device, depending upon the embodimentemployed to singulate the microelectronic device 900 from a wafer 202.The side surface may further include a second portion extending from thefirst portion to another of the active surface and the rear surfacehaving a less uneven surface.

FIG. 9 illustrates a plan view of a side surface 906 of amicroelectronic device 900 singulated by the method described above. Theside surface 906 of the microelectronic device 900 may exhibit damage908 from the implanted ions. As described above, the damage 908 mayinclude dislocations and point defects resulting from the impact of theindividual ions in the implant process. The damage 908 may show as peaksand valleys in the side of the microelectronic device 900 extending fromthe ion-implanted surface of the die 900 at least to an area of maximumspecies penetration. The side surface 906 may also include fracturelines 910 extending from the jagged or broken edges of the damage 908.The fracture lines 910 may be the result of the cracks 702 describedabove that are formed by heating and/or stretching the wafer 202.

The side surface 906 of the microelectronic device 900 may also includeresidual ions 912 embedded within the side surface 906, such that theresidual ions 912 may be detected, such as through secondary ion massspectrometry (SIMS) or energy-dispersive X-ray spectroscopy (ERX) fromthe side surface 906 and may not be on the outer portion of the sidesurface 906 connected to the fracture lines 910. Some of the portions ofdamage 908 and/or residual ions 912 may be larger than others. Forexample, as described above, some of the ion species may be larger, suchas boron, phosphorus, arsenic and some may be smaller, such as hydrogen.In some embodiments, the implant process may use multiple different ionspecies to achieve damage at different depths. The larger damage 908and/or residual ions 912 may be closer to a first surface 902 than thesmaller damage 908 and/or residual ions 912. The first surface 902 maybe the surface into which the ions were implanted that is adjacent andtransverse to the side surface 906.

In some embodiments, only one species may be used. Some of ions maytravel a greater distance into the wafer while others may experiencemore early collisions and may stop closer to the first surface 902. Theions that travel farther into the wafer may experience collisions asthey pass through the areas of the wafer closer to the first surface902. Therefore, the larger amounts of damage 908 and/or number ofresidual ions 912 may remain closer to the first surface 902, with theamount of damage and/or number of residual ion 912 gradually reducing asthe distance from the first surface 902 increases. Such an approach mayresult in a wedge effect, enhancing the potential for cleaving at lowertemperatures, lower tensile stresses, or both.

The damage 908 and/or residual ions 912 may extend to a distance fromthe first surface 902 of between about 1 μm and about 6 μm, such asbetween about 2 μm and about 5 μm, or between about 2 μm and about 4 μm.

As described above, the ions may be implanted into the active surface208 or the rear surface 302 of the wafer 202. Therefore, in someembodiments, the first surface 902 may coincide with the active surface208 of the wafer 202 and associated semiconductor dice 900. In otherembodiments, the first surface 902 may coincide with the rear surface302 of the wafer 202 and associated semiconductor dice 900. A secondsurface 904 on an opposite side of the microelectronic device 900 may bethe opposing active surface 208 or rear surface 302 from the firstsurface 902 of the wafer 202 and associated semiconductor die 900. Thedistance between the first surface 902 and the second surface 904 may besubstantially the same as the final thickness of the associated wafer202 after the thinning process illustrated in FIG. 4 . Therefore, thedistance between the first surface 902 and the second surface 904 may beless than about 30 μm, such as less than about 20 μm, or less than about10 μm.

FIG. 10 illustrates a profile view of a side surface 906 of thesemiconductor die 900. The portion of the side surface 906 where thedamage 908 is present may exhibit a highly irregular topography 1002characterized by sharp edges, protrusions, and recesses surrounding thepoints of damage 908 where the ions collided with the materials of thewafer as they were implanted into the first surface 902 of the wafer202. Thus, the highly irregular topography 1002 may begin proximate thefirst surface 902 of the microelectronic device 900 extending toward thesecond surface 904. The highly irregular topography 1002 may extend adistance from the first surface 902 of between about 1 μm and about 6μm, such as between about 2 μm and about 5 μm, or between about 2 μm andabout 4 μm.

The remainder of the side surface 906 may be a somewhat irregular, butless uneven surface 1004, characterized by flat surfaces interrupted byfracture lines 910. The uneven surface 1004 may extend from the highlyirregular topography 1002 to the second surface 904.

As described above, residual ions 912 may also be imbedded in themicroelectronic device 900 to a depth beneath the side surface 906 ofthe microelectronic device 900. The residual ion 912 may be located inthe microelectronic device 900 in substantially the same regions as thehighly irregular topography 1002 and laterally adjacent the highlyirregular topography 1002.

FIG. 11 illustrates a top view of the microelectronic device 900. Themicroelectronic device 900 may include an active region 1106 whereintegrated circuitry and associated features of the microelectronicdevice 900 may be formed. The active region 1106 of the microelectronicdevice 900 may be substantially surrounded by a barrier 1104 extendingdownwardly from the surface including active region 1106 into thesemiconductor material of the microelectronic device 900 and configuredto separate the active region 1106 from side surfaces 906, which mayform the outer perimeter of the microelectronic device 900. The barrier1104 may be formed from a material selected to substantially preventdiffusion of other materials, such as the ions from the implant process,into peripheral areas of the active region 1106 bearing integratedcircuitry. The barrier 1104 may be formed from a material such astungsten, titanium, cobalt, ruthenium, tantalum, tantalum nitride,indium oxide, tungsten nitride, titanium nitride, etc. In someembodiments, the barrier 1104 may also be configured to mechanicallyprotect the active region 1106, such that when the wafer is singulatedany resulting cracks in the side surfaces 906 do not propagate into theactive region 1106.

The side surfaces 906 may include residual ions 912 embedded from theimplant process. The active region 1106 may be substantially free ofresidual ions 912. As described above, the implant process may include amask 502 configured to substantially control the locations where theimplanted ions are directed to coincide with the streets 206.Furthermore, as noted above, the barrier 1104 may be configured tosubstantially block any errant ions from entering the active region 1106from semiconductor material adjacent to side surfaces 906.

Some embodiments of the present disclosure may include a microelectronicpackage. The microelectronic package may include one or moremicroelectronic devices. The microelectronic devices may each includeside surfaces of semiconductor material. The side surfaces may include afirst portion having a highly irregular topography. The highly irregulartopography may extend to a distance of between about 2 μm and about 6 μmfrom an adjacent major surface of the microelectronic device. The sidesurface may further include a second portion adjacent the first portionand having a less uneven surface.

FIG. 12 illustrates a microelectronic device 1200 formed from a stack ofsemiconductor dice 1202. The sides of the stack of semiconductor dice1202 may be characterized by a pattern of alternating highly irregularsurface topographies 1208 and uneven surfaces 1204. As shown,semiconductor dice 1202 were fabricated using implantation of a wafer202 from a rear surface 302 thereof, resulting in highly irregularsurface topographies 1208 on the upper portions of sides 1206 ofsemiconductor dice 1202.

The semiconductor dice 1202 may be stacked on a substrate 1212configured to electrically couple the stack of dice 1202 to anothercomponent. The substrate 1212 may include discrete connection elementsin the form of solder bumps 1210 configured to connect to higher levelpackaging. The substrate 1212 may be electrically coupled to the stackof die 1202, such as through TSVs (not shown) formed through eachsemiconductor die 1202. Similarly, each semiconductor die 1202 may beelectrically coupled to the adjacent dice 1202 through the TSVs andconductive elements extending through the bond lines between adjacentsemiconductor dice 1202 of the stack. For example, conductive (e.g.,copper) pillars may connect to aligned terminal pads of adjacentsemiconductor dice through solder reflow or diffusion bonding tooperably couple the TSVs of adjacent dice 1202.

Embodiments of the present disclosure may enable the streets between dielocations on a wafer to be reduced in width by requiring a much smallerarea to complete the dicing operations to singulate a wafer intoindividual dice. Reducing the street width between the die locations onthe wafer may enable a larger number of dice to be fabricated from asingle wafer of semiconductor material.

Furthermore, embodiments of the present disclosure may substantiallydecrease the organic (e.g., polymer film residue, adhesive residue) andinorganic (e.g., semiconductor material) contaminant particles producedduring the process of dicing or singulating individual semiconductordice from a wafer. Residual contaminant particles on individualsemiconductor dice may, as previously noted, cause damage and/orfailures in associated microelectronic devices. Thus, reducing thevolume of contaminant particles produced during the dicing orsingulation process may similarly decrease the potential for damage orfailures of the dice and associated microelectronic devices. Reducingthe number of damaged or failed dice or microelectronic devices anddecreasing the space required between the individual dice on each wafermay increase the yield and reliability of semiconductor dice andmicroelectronic devices incorporating such dice.

Increasing the yield of microelectronic devices by reducing the numberof compromised semiconductor dice or assemblies and packages of same mayincrease the yield of such assemblies and packages, resulting in greaterprofitability from reduced costs for the production of the associatedmicroelectronic devices. The microelectronic devices may be included inmultiple different types of electronic devices, such as personalelectronics (e.g., mobile devices, phones, tablets, etc.), computers(e.g., personal computers, laptops, etc.), etc. Reducing the cost ofproducing the microelectronic devices may in turn reduce the cost ofproducing the associated electronic devices.

The embodiments of the disclosure described above and illustrated in theaccompanying drawing figures do not limit the scope of the invention,since these embodiments are merely examples of embodiments of theinvention, which is defined by the appended claims and their legalequivalents. Any equivalent embodiments are intended to be within thescope of this disclosure. Indeed, various modifications of the presentdisclosure, in addition to those shown and described herein, such asalternative useful combinations of the elements described, may becomeapparent to those skilled in the art from the description. Suchmodifications and embodiments are also intended to fall within the scopeof the appended claims and their legal equivalents.

What is claimed is:
 1. A microelectronic device comprising: asemiconductor material, including an active surface and a rear surfaceopposite the active surface; side surfaces of the semiconductor materialextending between the active surface and the rear surface and including:a first portion having a highly irregular surface topography includingresidual ions, the highly irregular surface topography extending to adistance of between 2 μm and 6 μm from one of the active surface and therear surface of the microelectronic device; and a second portionextending from the first portion to another of the active surface andthe rear surface having less uneven surface.
 2. The microelectronicdevice of claim 1, further comprising an active region comprisingintegrated circuitry over the active surface laterally inset from theside surfaces.
 3. The microelectronic device of claim 2, furthercomprising a barrier region positioned peripherally between the activeregion and the side surfaces.
 4. The microelectronic device of claim 3,wherein the barrier region is formed from a material selected tosubstantially prevent diffusion of materials other than thesemiconductor material to the active region.
 5. The microelectronicdevice of claim 3, wherein the barrier region is formed from a materialselected from the group consisting of tungsten, titanium, cobalt,ruthenium, tantalum, tantalum nitride, indium oxide, tungsten nitride,and titanium nitride.
 6. The microelectronic device of claim 2, furthercomprising residual implant ions adjacent the first portions of the sidesurfaces.
 7. The microelectronic device of claim 6, wherein the residualimplant ions comprise one or more of boron, phosphorus, arsenic, heliumand hydrogen.
 8. The microelectronic device of claim 7, wherein theresidual implant ions comprise one of hydrogen or helium at a depthadjacent the first portion from either the active surface or the rearsurface, and one of boron, phosphorus or arsenic at a lesser depthadjacent the first portion from a same surface as the hydrogen.
 9. Themicroelectronic device of claim 1, wherein the highly irregular surfacetopography comprises point damage caused by an ion implantation process.10. The microelectronic device of claim 1, wherein the less unevensurface comprises flat surfaces interrupted by fracture lines.
 11. Themicroelectronic device of claim 1, wherein a distance between the activesurface and the rear surface is less than 30 microns (μm).
 12. Amicroelectronic package comprising: one or more microelectronic devices,each comprising: side surfaces of a semiconductor material andincluding: a first portion having a highly irregular surface topographyincluding one or more of point defects and dislocations, extending adistance of between 2 μm and 6 μm from an adjacent major surface of themicroelectronic device; and a second portion adjacent the first portionand having a less uneven surface.
 13. The microelectronic package ofclaim 12, wherein the less uneven surface comprises flat surfacesinterrupted by fracture lines.
 14. The microelectronic package of claim12, wherein the highly irregular surface topography is adjacent portionsof the semiconductor material including implant ions of one or more ofhydrogen, helium, boron, phosphorus and arsenic.
 15. A method ofmanufacturing a microelectronic device, the method comprising: formingmicroelectronic devices on an active surface of a wafer; securing thewafer to a carrier wafer; implanting ions to initiate dislocations insemiconductor material of the wafer along streets between themicroelectronic devices, the dislocations extending to a distance ofbetween 2 μm and 6 μm from one of the active surface and a rear surfaceof the wafer; thinning the wafer to about 30 microns (μm) or less; andheating the wafer to form cracks along the streets from stressconcentrations proximate the dislocations.
 16. The method of claim 15,wherein implanting ions comprises implanting ions through a mask havingopenings substantially aligned with the streets between themicroelectronic devices.
 17. The method of claim 16, wherein the maskcomprises a same mask as used to fabricate features of themicroelectronic devices.
 18. The method of claim 16, wherein the maskcomprises a reusable mask coupled to a face of an implant tool or withina chamber of an implant tool.
 19. The method of claim 15, comprisingimplanting ions along the streets between the microelectronic devicesfrom an active side of the wafer.
 20. The method of claim 15, comprisingimplanting ions along the streets between the microelectronic devicesfrom a rear side of the wafer.
 21. The method of claim 15, whereininitiating dislocation in the wafer comprises initiating dislocations toa depth between 1 μm and 6 μm from an active surface or a rear surfaceof the wafer.
 22. The method of claim 15, wherein heating the wafercomprises raising a temperature of the wafer by between 150° F. and 250°F. above ambient temperature.
 23. The method of claim 15, whereinimplanting ions includes implanting ions of one or more of hydrogen,helium, boron, phosphorus and arsenic.
 24. The method of claim 23,further including implanting ions of hydrogen or helium to a greaterdepth from an active surface or a rear surface of the wafer than a depthof implanting ions or boron, phosphorus or arsenic from a same surface.25. A method of separating microelectronic devices from a wafer, themethod comprising: employing an ion implantation process to provokedislocations in a semiconductor wafer in streets between themicroelectronic devices, the dislocations extending to a distance ofbetween 2 μm and 6 μm from an adjacent major surface of thesemiconductor wafer; transferring the semiconductor wafer to a laterallyexpandable carrier material and adhering the semiconductor wafer to asurface of the carrier material; and applying a tensile force on thewafer by expansion of the carrier material to form cracks in the streetsbetween the microelectronic devices and separate the microelectronicdevices.
 26. The method of claim 25, wherein implanting ions is effectedinto a surface of the semiconductor wafer through a mask having openingssubstantially aligned with the streets between the microelectronicdevices.
 27. The method of claim 25, wherein the surface of thesemiconductor wafer comprises one of an active surface or a rear surfaceopposite the active surface.
 28. The method of claim 25, furthercomprising, before employing the ion implantation process: thinning thesemiconductor wafer from a rear surface thereof while supported on andsecured to a rigid carrier structure from an initial thickness to athickness of 30 μm or less; and, after employing the implantationprocess: inverting the carrier structure to transfer and adhere thesemiconductor wafer to the laterally expandable carrier material; andreleasing the carrier structure from the semiconductor wafer beforeexpanding the carrier material.